Shanghai Nateng Instrument Co., Ltd
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EUV/X-ray reflector
EUV/X-ray reflector
Product details

XUVmanyLayer reflector



X-ray multilayer reflector

Application examples

Substrate material

Typical wavelength

XUVEUV)Reflector mirror

EUVPhotolithography

Application of high-order harmonics

Aces Science

XX-ray laser

Multi-layer reflector

Mp/Si

Ru/Si

Zr/Al

SiC/Mg

Cr/C

50Electron voltage to100Electronic voltage

50Electron voltage to100Electronic voltage

50Electron voltage to70Electronic voltage

25Electron voltage to50Electronic voltage

to300Electronic voltage

Single-layer reflector

SiC

Pt

Ru

10Electron voltage to100Electronic voltage

XX-ray reflector

Synchrotron applications

XFELapplication

built-inXX-ray non-destructive testing equipment

Multi-layer reflector

W/C

W/B4C

Ru/C

Pt/C

1kElectron voltage to30kElectronic voltage

Single-layer reflector

C

B4C

SiC

Cr

Ni

1kElectron voltage to30kElectronic voltage

XUVMulti-layer reflector

describe

Substrate shape: flat, convex, concave, parabolic, toroidal, ellipsoidal

Substrate materials: quartz, siliconzero dewerWait, wait

Multilayer film material:Mo/SiRu/SiZr/AlSiC/MgCr/CWait, wait

Substrate size: φ3Millimeter to φ300MillimeterMo/SiMultilayer mirrors have close proximity13Nano(90High reflectivity at the wavelength of electron volts.NTT-ATofMo/SiMultilayer mirrors have a high70%The normal incidence reflectance.NTT-ATofXUVThe material, film structure, and substrate shape of the reflector can be customized to meet the needs of users regarding center wavelength and optical devices.

Substrate shape: flat, ellipsoidal, parabolic, cylindrical, toroidal

Substrate: Quartz, Siliconzero dewerWait, wait

Substrate material:W/B4CW/CPt/CWaiting for substrate size: maximum500MillimeterNTT-ATprovideK-BMirror systems, Walter mirrors, etc

XX-ray multilayer reflector

describe

Reflectance, pink; Calculated reflectivity, period length:2.95Nano)W/B4CMulti layer andW/CMultilayer film reflector for hardXRadiation applications have high reflectivity. In order to effectively reflect and gather hardnessXRadiation must minimize the angle of incidence as much as possible. This requires a longer length of the reflector and a smaller perimeter of the multilayer film.

Single-layer reflector

describe

Substrate shape: flat, ellipsoidal, parabolic, cylindrical, toroidal

Substrate materials: quartz, siliconzero dewerWait, wait

Multilayer materials:CB4CSiCRuNbNPtWait, wait

Substrate size: maximum500Millimeter

Using a single-layer mirror with total reflection for beam control, light aggregation, and removalXUVtoXNo wavelength required within the radiation range.NTT-ATThe material and substrate shape of the single-layer reflector can be customized to meet the needs of users regarding the center wavelength and optical device. Elliptical mirror with ruthenium layer


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